Application Potential of Thin Silicon Oxide Films Prepared by Plasma Assisted CVD at Atmospheric Pressure
Artikelnummer: GALVANO-2624
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Application Potential of Thin Silicon Ox
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Beschreibung
The use of atmospheric plasma sources for the surface activation is well known for several years and state of the art in many industry sectors. Especially in the plastics processing industry plasma sources based on the dielectric barrier discharge are widely-used.