2884 2889 GT 1210.pdf.1389254152

Application Potential of Thin Silicon Oxide Films Prepared by Plasma Assisted CVD at Atmospheric Pressure

Artikelnummer: GALVANO-2624
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Application Potential of Thin Silicon Ox
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Beschreibung The use of atmospheric plasma sources for the surface activation is well known for several years and state of the art in many industry sectors. Especially in the plastics processing industry plasma sources based on the dielectric barrier discharge are widely-used.