With the 'IndiNaPoly' project, the Fraunhofer Institute for Structural Durability and System Reliability LBF, together with the Fraunhofer Institute for Electronic Nano Systems ENAS, aims to pave the way for more compact and more powerful components for the semiconductor industry. A customizable polymer platform is being developed that is suitable for the mass production of high-resolution microstructures.
The focus is on a new type of radiation-sensitive coating for electron beam lithography that can image nanoscale structures faster and more precisely. Fraunhofer LBF is optimizing the molecular structure and focusing on sustainable synthesis methods. In parallel, Fraunhofer ENAS is integrating the developed resists into real production processes and testing their suitability for future applications such as AI chips, quantum and sensor technology. The combination of high-resolution imaging and shorter exposure times not only reduces energy requirements, but also increases process stability.
'IndiNaPoly' will be funded over three years as part of the PREPARE program. Manufacturers of specialty polymers, photoresists and semiconductor components should benefit directly from the results.
