Winfried Kaiser, Head of Product Strategy at Zeiss Semiconductor Manufacturing Technology (SMT), has received the prestigious Frits Zernike Award for Microlithography 2020 from the International Society for Optics and Photonics (SPIE). Kaiser accepted the award at the SPIE Advanced Lithography trade fair in San José, California. The award is considered the highest honor in microlithography.
Kaiser initiated the introduction of the development program for lithography with extreme ultraviolet light (EUV) in Europe 25 years ago. As a revolutionary manufacturing technology, EUV lithography with a light wavelength of 13.5 nm has enabled the series production of high-performance microchips with the finest structures since 2019. Kaiser was also a key figure in the development of lithography technologies such as deep ultraviolet (DUV) systems, which are now the industry standard - in particular lithography with light wavelengths of 248 and 193 nm and immersion lithography. -dir/vk-
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