Working under perfect conditions and saving considerable costs at the same time - this is made possible by the metal-free wet-dry workbench from MK Versuchsanlagen, which was developed for applications in semiconductor technology, for example.
Of particular interest for work processes in semiconductor technology is the fact that the wet/dry workbench, designed as a mini-environment, offers maximum cleanliness directly at the workplace and can be used if the highest cleanliness levels (cleanroom class ISO 3) are required.
In addition, its air management system enables energy consumption to be reduced by up to 50%. This is achieved by a ventilation system developed in-house by the special system manufacturer, which is used in all metal-free systems from MK Versuchsanlagen.
What is particularly interesting is that even in the case of critical room ventilation, retrofitting in existing clean rooms is easily possible thanks to a special ventilation concept. This means that the energy-saving effect can also be realized in these cases. The metal-free workbenches also offer maximum corrosion and product protection.
Fig. 2: Wet and dry workbench versions side by side
Fig. 3: MK systems offer perfect working conditions for semiconductor technologies
Simple integration into existing systems
A Quick Dump Rinse (QDR) basin for cleaning semiconductor plates can be integrated into the wet/dry workbench. The QDR basin has a modular design and is divided into a process basin and a collection basin. The semiconductor plates or the wafer carrier are cleaned in the process tank.
Cleaning is carried out using a spray system that fills the basin with high-purity water and thus stops the etching process on the semiconductor plates. The impurities removed from the semiconductor plates in this way are flushed out by the suction created when the valve is opened.
Like the entire hardware, the software is also an in-house development of the special system manufacturer. According to MK Versuchsanlagen, the advantage is that integration into existing, higher-level digital systems can be easily implemented. Direct BMS integration is just as possible as connection to LIMS or MES systems via an OPC UA interface (Industry 4.0). This makes it possible to create an optimal environment that integrates all processes and process devices into the minienvironments.
Fig. 4: The QDR basin can be integrated into the wet-dry workbench
Technical data on the QDR basin:
- Material: Polypropylene (PP)
- Capacity: 22.5 liters
- Overflow weir: 360°
- Number of spray nozzles: 8
- Filling time: approx. 120 seconds
- Drain time: approx. 10 seconds
- Wafer carrier size: up to 8"
- Rinsing medium: DI water
- QDR drain valve:
2.5 to 5.6 Kg/cm2
The wet/dry workbench is equipped with a working chamber with pressure monitoring for process reliability, a PLC control, automated front slide with individual adjustment, VSR connections for supply and exhaust air, supply air filter (class H14) and lighting (including yellow light). The light grid and temperature monitoring elements for the working chamber and exhaust air are also standard. Status signaling is provided by LED and buzzer. Further equipment options for the wet/dry workbench include:Integrated hatch to the neighboring workbench
- Connections for thermal decomposition unit (TAE)
- Media supply on customer request (individual testing)
- Control panels for media (hand, foot, display)
- Ultrasonic tank
- Exhaust air scrubber and exhaust air sprinkler system
- Underfloor rinsing
- Partition wall
- Connection options Temperature monitoring
- Remote maintenance on customer request
- Ionizer
- Quick dump rinse tank
- Process basin
- Rinsing basin
- Spin Coater
MK Versuchsanlagen und Laborbedarf e. K., founded in 1988, develops and builds metal-free cleanroom systems and cleanrooms. The portfolio also includes cost-efficient and automated glove testing devices. The company is certified according to ISO 9001:2015. The products are used by the world's leading pharmaceutical companies and laboratories with the highest quality standards.
