Eindhoven University of Technology (TU/e) has commissioned a new machine for "Spatial Atomic Layer Deposition" (SALD) from the start-up SALD BV. The process is suitable for the rapid application of atomic coatings in multiple layers on a substrate in order to achieve new material properties. The R&D work will focus on atomic-scale processing for energy and information technologies such as photovoltaics and nanoelectronics.
The SALD machine is a system optimized for research and development that can be easily adapted to investigate the influence of different factors on the process of "Spatial Atomic Layer Deposition". A decisive advantage of SALD compared to the conventional ALD process is the higher speed. In Spatial ALD, the atomic layers are produced much faster by "flying" the substrate through different zones of the reactor, with each zone containing different gases or reactants. The "flying" of the substrate allows for faster layer deposition while maintaining accuracy. The speed advantage is particularly important for industrial applications.
